Cleaning and assessment system of various substrates and wafers
Application Size |
|
---|---|
Power Source | RF Generator, 13.56MHz, 300W |
Vacuum Pump | 617L/Min Dry Pump [Option : Oil Rotary Pump] |
Gas Flow Controller | 1 Mass Flow Controller for Standard [Option : Additional MFC (O2 or Other Gas)] |
System Dimension | W720mm * H733mm * D761mm (Except Tower Lamp) [Pump : W330mm * H530mm * D780mm] |
Internal Chamber Size | W424mm * H274mm * D437mm |
Weight | Aro 170Kg |
Utility | 220VAC, 3Phase, 6A, Air : 5kgf/㎠, Ar : 3kgf/㎠, N2 : 4kgf/㎠ |
PC Based Main Control | Windows XP Embedded & C++ Language & TFT LCD Touch Screen |
Various functions realized by electrode plate replacement
Easy to install
PC-based easy operation